Списък на публикациите на проф. (ст н. с. Iст.) дфн Катя Желева Вутова



Дата13.09.2016
Размер75.98 Kb.
#9177
СПИСЪК НА ПУБЛИКАЦИИТЕ

на проф. (ст.н.с. Iст.) дфн Катя Желева Вутова


  1. Mladenov, R.Dimitrova, O.Stojanova, K.Jeleva, “Monte Carlo calculation on electron scattering in thin polymer film”, Proc. of the 1st Intern. Conf. on Electron Beam Technologies, Varna, (1985), 32-39.

  2. G.Mladenov, R.Dimitrova, K.Jeleva, “Electron beam scattering and energy dissipation in a thin polymer film”, Proc. of the Seventh Czechoslovak Conference on Electron and Vacuum Physics, part 2, (1985), 514-521.

  1. Г.Младенов, С.Сабчевски, К.Вутова, “Оценка эмиттанса и яркости пучков заряженных частиц, применяемых в технологических процессах”, Болг. Физ. Журнал, 14, (1987), 1, 97-102.

  2. Г.Младенов, Р.Димитрова, К.Вутова, “Цифровое моделирование проникновения быстрых электронов в твердые образцы”, Болг. Физ. Журнал, 14, (1987), 5, 446-456.

  3. Р.Димитрова, Г.Младенов, К.Вутова, “Теоретическое и экспериментальное исследование параметров функции, характеризирующей эффект близости”, Болг. Физ. Журнал, 14, (1987), 6, 589-595.

  1. Г.Младенов, Р.Димитрова, К.Вутова, “Моделирование процессов в электронной литографии”, Вторая Междунар. конф. по элекроннолучевым технологиям, Варна, (1988): Труды. ЭЛТ-88, 73-81.

7. K.Vutova, G.Mladenov, “Methodology for determining the radiation efficiency and contrast characteristics in the case of electron and ion lithography, using positive polymer resists”, Thin Solid Films, 200, (1991), 353-362.

  1. K.Vutova, G.Мladenov, “Absorbed energy distribution in electron lithography of simple patterns”, Journal of Information Recording Materials, 19, (1991), 4, 261-269.

  2. K.Vutova, G.Mladenov, “Mathematical modeling of the development process in electron lithography”, Journal of Information Recording Materials, 19, (1991), 4, 271-282.

  3. K.Vutova, G.Mladenov, “Modelling of physical processes in ion lithography”, Thin Solid Films, 214, (1992), 144-149.

  4. V.Vassileva, K.Vutova, L.Georgiev, T.Nikolov, G.Mladenov, “The electron beam melting method for fabrication of oxygen-free copper”, Proc. of the Intern. Conf. on Electron Beam Melting and Refining, State of the Art 1992, Reno, Nevada, USA, ed. R.Bakish, (1992), 233-242.

  5. К.Вутова, Г.Младенов, “Методика вычисления значении радиационной эффективности и характеристики контраста в электронной и ионной литографиях позитивных полимерных резистов”, Поверхность, 7, (1991), 96-103.

  6. К.Вутова, “Моделиране на процесите на експониране и проявяване при електронна и йонна литографии”, дисертация за присъждане на образователната и научна степен “доктор”, София, 1992.

  7. K.Vutova, G.Mladenov, “Modeling of exposure and development processes in electron and ion lithography”, Modelling and Simulation in Materials Science and Engineering, 2, (1994), 239-254.

  8. K.Vutova, G.Mladenov, “Evaluation of the dimensions of weld and thermal effected zones during electron beam treatment”, Proc. of the 4th Intern. Conf. on Electron Beam Technologies, Varna, (1994), 101-107.

  9. G.Mladenov, K. Vutova, I. Tsakov, S. Sabchevski, “Coherent electron beams”, Proc. of the 4th Intern. Conf. on Electron Beam Technologies, Varna, (1994), 167-172.

  10. G.Mladenov, K.Vutova, S.Sabchevsky, “Computer simulation of the processes at electron beam technologies”, Proc. of the Intern. Conf. on Electron Beam Melting and Refining, State of the Art 1994, Reno, Nevada, USA, ed. R.Bakish, (1994), 283-294.

  11. K.Vutova, G.Mladenov, “Mathematical modeling and software for computer simulation of processes in electron lithography”, Proc. of the 4th Intern. Conf. on Electron Beam Technologies, Varna, (1994), 158-166.

  12. Y.M.Gueorguiev, K.Vutova, G.Mladenov, “A Monte Carlo study of proximity effects in electron-beam patterning of high-Tc superconducting thin films”, Physica C, 249, (1995), 187-195.

  13. G.Mladenov, V.Vassileva, K.Vutova and T.Nikolov, “Investigations of refining processes during electron beam melting”, Vacuum, 47 (6-8), (1996), 825-828.

  14. Y.M.Gueorguiev, K.Vutova, G.Mladenov, “Analysis of the proximity function in electron-beam lithography on high-Tc superconducting thin-films”, Supercond. Sci. Technol., 9, (1996), 565-569.

  15. Г.Младенов, К.Вутова, С.Тинчев, “Компютърно моделиране на ефекти при йонна бомбардировка на ВТСП тънки слоеве”, Материали на нац. конф. с межд. участие “Електроника'96”, Ботевград, изд. СЕЕС, (1996), стр. 150-155.

  16. Катя Ж.Вутова, Йордан М.Георгиев, Георги М.Младенов, “Числено моделиране на процесите при електронна литография. Разпределение на погълнатата енергия”, Електротехника и Електроника, 3-4, (1996), 16-20.

  17. К. Вутова, Г. Младенов, В. Василева, “Компютърно симулиране на топлинните процеси при електроннолъчево топене и рафиниране на мед”, Материали на нац. конф. с межд. участие “Електроника'96”, Ботевград, изд. СЕЕС, (1996), стр. 173-177.

  18. Катя Ж.Вутова, Георги М.Младенов, “Числено моделиране на процесите при електронна литография. Процес на проявяване.”, Електротехника и Електроника, 5-6, (1996), 11-15.

  19. Й.Георгиев, К.Вутова, Г.Младенов, “Числено моделиране на експониране и проявяване при електронна литография върху структури, съдържащи високотемпературни свръхпроводящи тънки слоеве”, Материали на нац. конф. с межд. участие “Електроника'96”, Ботевград, изд. СЕЕС, (1996), стр. 143-149.

  20. В.Василева, К.Вутова, Т.Николов, П.Влаев, Г.Буков, Г.Младенов, “Електроннолъчево топене, рафиниране и регенериране на чисти метали и сплави за електрониката”, Материали на нац. конф. с межд. участие ”Електроника'96”, Ботевград, изд. СЕЕС, (1996), стр. 167-172.

  21. K.Vutova, G.Mladenov, “Computer simulation of the heat transfer through molten pool during electron beam melting and evaporation”, Proc. of the 5th Intern. Conf. on Electron Beam Technologies, Varna, (1997), 273-280.

  22. G.Mladenov, S.Wojcicki, K.Vutova, S.Sabchevski, “Electron beam welding thermal efficiency”, Proc. of the 5th Intern. Conf. on Electron Beam Technologies, Varna, (1997), 71-75.

  23. K.Vutova, V.Vassileva, G.Mladenov, “Simulation of the Heat Transfer Process through Treated Metal, Melted in a Water-Cooled Crucible by an Electron Beam”, Vacuum, 48 (2), (1997), 143-148.

  24. V.Vassileva, K.Vutova, T.Nikolov, G.Bukov, G.Mladenov, P.Vlaev, “Investigation of the crystallization processes in continuous casting during electron beam melting”, Proc. of the 5th Intern. Conf. on Electron Beam Technologies, Varna, (1997), 281-286.

  25. К.Вутова, Г.Младенов, Т.Танака, К.Кавабата, “Използуване на фотоелектронна рентгенова спектроскопия за характеризиране на повърхностна грапавост”, Материали на нац. конф. с межд. участие “Електроника'98”, Ботевград, изд. СЕЕС, (1998), стр. 29-35.

  26. Y.Gueorguiev, K.Vutova, G.Mladenov, "Numerical modelling of the processes of exposure and development in electron beam lithography on high-temperature superconducting thin films", Mathematics and Computer in Simulation, 47, (1998), 299-307.

  27. G.Mladenov, K.Vutova, S.Wojcicki, “Experimental investigation of the weld depth and thermal efficiency during electron beam welding”, Vacuum, 51 (2), (1998), 231-233.

  1. G.Mladenov, K.Vutova, K.Kawabata, T.Tanaka, “XPS profilography through angle resolved spectra”, Proc. of the Nat. Conf. with Intern. Participation “Electronica'98”, Botevgrad, Publ. UEEEC, (1998), 36-41.

  2. K.Vutova, G.Mladenov, “Computer simulation of the heat transfer during electron beam melting and refining”, Vacuum, 53 (1-2), (1999), 87-91.

  3. E.Koleva, G.Mladenov, K.Vutova, “Calculation of weld parameters and thermal efficiency in electron beam welding”, Vacuum, 53 (1-2), (1999), 67-70.

  4. G.Mladenov, K.Vutova, T.Tanaka, K.Kawabata, “X-ray Photoelectron Profilography”, Journal of Surface Analysis, 5 (1), (1999), 82-85.

  5. K.Vutova, G.Mladenov, T.Tanaka, K.Kawabata, “Evaluation of thin film surface topology shapes”, Mathematics and Computers in Simulation, v.49, No 4-5, (1999), 275-283.

  6. Y.Gueorguiev, K.Vutova, G.Mladenov, “Numerical modelling of the processes of exposure and development in electron beam lithography on high temperature superconductor thin films”, Thin Solid Films, 323, (1998), 222-226.

  7. K.Vutova, G.Mladenov, T.Tanaka, K.Kawabata, “Photoelectron Signal Simulation from Textured Overlayer Samples”, Surface and Interface Analysis, 30, (2000), 552-556.

  8. V.Vassileva, K.Vutova, G.Mladenov, “An Investigation on the Heat Transfer Influence on the Crystallisation Processes during the Electron Beam Melting and Casting of Metals”, Vacuum, 62, (2001), 197-202.

  9. E.Koleva, K.Vutova, S.Wojcicki, G.Mladenov, “Radial Distributions of the Beam Current Density as Source for Evaluation of Beam Emittance and Brightness”, Vacuum, 62, (2001), 105-112.

  10. K.Vutova, G.Mladenov, I.Raptis, “Determination of the radiation efficiency, contrast and sensitivity in electron and ion lithography”, Proc. of the Intern. Conf. on Simulation of Semiconductor Processes and Devices, “SISPAD 2001”, Athens, ed. D.Tsoukalas, Publ. Springer-Verlag, (2001), 440-443.

  11. K.Vutova, G.Mladenov, T.Tanaka, K.Kawabata, “Photoelectron signal simulation from textured samples covered by a thin film”, Vacuum, 62, (2001), 297-302.

  12. G.Mladenov, K.Vutova, I.Raptis, P.Argitis, I.Rangelow, “Simulation of latent image formation for ion beam projection lithography”, Microelectronic Engineering, 57-58, (2001), 335-342.

  13. E.Koleva, K.Vutova, G.Mladenov, “The role of thermal contact ingot-crucible at mathematical modelling of the heat transfer during electron beam melting”, Vacuum, 62, (2001), 189-196.

  14. K.Vutova, G.Mladenov, “Sensitivity, contrast and development process in electron and ion lithography”, Microelectronic Engineering, 57-58, (2001), 349-353.

  15. K.Vutova, G.Mladenov, “Why light Ions in Future Ion Lithography”, Vacuum, 62, (2001), 273-278.

  16. K.Vutova, G.Mladenov, T.Tanaka, K.Kawabata, “Photoelectron Signal Simulation from Textured Samples with Modified Surface Composition”, Surface and Interface Analysis, 34, (2002), 597-600.

  17. G. Mladenov, K.Vutova, “Computer simulation of exposure and development in electron and ion lithography”, Proc. of St.-Petersburg Electrotechnical University, issue “Solid State Physics and Electronics”, St.-Petersburg, Russia, 1, (2002), 133-173.

  18. G.Mladenov, K.Vutova, G.Djanovsky, E.Koleva, V.Vassileva, D.Mollov, “Electron beam deposition of high temperature superconducting thin films”, published in “Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams” – NATO Science Series, Series II: Mathematics, Physics and Chemistry-Vol.88, Kluwer Academic Publishers, (2003), 163-171.

  19. K.Vutova, G.Mladenov, T.Tanaka, K.Kawabata, I.Rangelow, “Electron and ion beam lithography simulation for sub-quarter-micron patterns”, Proc. of the 7th Intern. Conf. on Electron Beam Technologies, Varna, (2003), 469-481.

  20. K.Vutova, G.Mladenov, Final report of the WTZ Scientific and Technological Cooperation Joint Project BGR 00/006 “Computer Simulation of Processes in Electron and Ion Lithography for microelectronics and photonics” between the IE-BAS and the University of Kassel, Institute of Technological Physics, Kassel, Germany, (2001-2003), pp.1-65.

  21. A.Olziersky, K.Vutova, G.Mladenov, I.Raptis, T.Donchev, "Electron beam lithography simulation on superconducting substrates", Supercond. Sci. Technol., 17, (2004), 881-890.

  22. Vutova K., G. Mladenov, “Application of XPS analysis for characterization of smooth samples, textured samples and overlayers on samples”, Proc. of Indo-Bulgarian Workshop on Electron Beam Technology and Applications, Mumbai, India, ed. A.K.Das, publ. Ebenezer Printing House, (2004), pp.158-168.

  23. Vutova K., G. Mladenov, “Electron and ion lithography – physical processes, computer simulation and experimental data”, Proc. of Indo-Bulgarian Workshop on Electron Beam Technology and Applications, Mumbai, India, ed. A.K.Das, publ. Ebenezer Printing House, (2004), pp. 212-242.

  24. Е.Колева, К.Вутова, П.Петров, Г.Младенов, “Разработки Института электроники Болгарской академии наук в области электронно-лучевой сварки”, журнал “Сварщик”, 5, (2004), 25-29.

  25. Vassileva V., K. Vutova, E. Koleva, T. Nikolov, E. Georgieva, G. Mladenov, “IE BAS experience in the electron beam melting and refining”, Proc. of Indo-Bulgarian Workshop on Electron Beam Technology and Applications, Mumbai, India, ed. A.K.Das, publ. Ebenezer Printing House, (2004), pp. 51-59.

  26. Е.Колева, К.Вутова, Г.Младенов, “Определяне на дозата на експониране за получаване на напълно проявен профил на резиста при електронна литография”, Материали на нац. конф. с межд. участие “Електроника'2004”, София, изд. СЕЕС, (2004), 87-92.

  27. Djanovski G., K. Vutova, S. Velinova, D. Mollov, G. Mladenov, “Preparation and characterization of high temperature superconductingY1Ba2Cu3O7-x thin films”, Proc. of Indo-Bulgarian Workshop on Electron Beam Technology and Applications, Mumbai, India, ed. A.K.Das, publ. Ebenezer Printing House, (2004), pp 144-148.

  28. Mladenov G., P. Petrov, E. Koleva, K. Vutova, “Electron beam welding process”, Proc. of Indo-Bulgarian Workshop on Electron Beam Technology and Applications, Mumbai, India, ed. A.K.Das, publ. Ebenezer Printing House, (2004), pp. 287–298.

  29. G.Mladenov, A.Yanev, K.Vutova, M.Petkov, T.Nurgaliev, E.Mateev, T.Donchev, V.Vasileva, G.Djanovsky, V.Ranev, E.Koleva, L.Neshkov, B.Blagoev, E.Georgieva, S.Velinova, D.Mollov, Report on NATO Science for Peace Programme SfP Project No 973718 “Damage Free Submicron Structures of High Temperature Superconducting Thin Films”, Annual Report 2004, Institute of electronics, BAS, ed. N.Gerassimov, Ch.Gelev, (2005), pp.93-105.

  30. Vutova K., E.Koleva, T.Tanaka, T.Takagi, G. Mladenov, “Ion modification of plastic materials”, Proc. of the Nat. Conf. with Intern. Participation “Electronika'2004”, Sofia, Publ. UEEE Bulgarian Section, (2004), 93-101.

  31. Г.Младенов, К.Вутова, “Електронна и йонна литография на наноразмерни структури”, Новости, информационен бюлетин за наука и технологии на БАН, София, (2005), стр.20-23.

  32. V.Vassileva, K.Vutova, G.Mladenov, “Analysis of the thermodynamic conditions and the kinetic factors governing the refining process during electron beam melting of reactive metals”, Int. Journal IEEE – Annual School. Lectures., 25(2), (2005), 25-34.

  33. K.Vutova, G.Mladenov, T.Tanaka, K.Kawabata, “Simulation of the energy absorption and the resist development at sub-150 nm ion lithography”, Microelectronic Engineering, 78-79 (2005), 533-539.
  34. Г.Младенов, К.Вутова, “Симулация на процесите при електронна и йонна литография”, Списание на БАН, книжка 5, (2005), 4-17.


  35. G.Mladenov, K.Vutova, E.Mateev, M.Petkov, E.Koleva, G.Djanovski, V.Videkov, B.Spangenberg, F.Merget, Y.Georgiev, “Development of superconducting bridge structures using photolithography and electron beam lithography”, Int. Journal IEEE – Annual School. Lectures., 25(1), (2005), 7-10.

  36. Г.Младенов, К.Вутова, “Положително оценени постижения на учени от БАН в Индия. Нов подход при моделиране и оптимизиране на мощни електронно-оптични системи, конструирани за технологични приложения.”- първа част, Новости, информационен бюлетин за наука и технологии на БАН, бр.4 (20), (2005), стр.1-2.

  37. G.Djanovski, K.Vutova, E.Koleva, M.Petkov, D.Mollov, S.Velinova, G.Mladenov, “Electron beam deposition and characterization of high temperature superconducting thin films”, Int. Journal IEEE – Annual School. Lectures., 25(2), (2005), 17-20.

  38. V.Vassileva, K.Vutova, E.Georgieva, G.Mladenov, “Investigation of Refining Processes During EB Regeneration of Reactive Metals of Group IV B”, Proc. of DAE-BRNS Symposium on Electron Beam Technology and Applications, SEBTA 2005, Mumbai, India, ed. M.Mascarenhas, (2005), pp.295-306.

  39. Г.Младенов, К.Вутова, “Положително оценени постижения на учени от БАН в Индия. Формиране на изискванията към устройствата за характеризиране на параметрите на мощните електронни снопове. Топене и очистване на метали във вакуум с електронен сноп.”- втора част, Новости - информационен бюлетин за наука и технологии на БАН, бр.5 (21), (2005), стр.1-2.

  40. E.Koleva, K.Vutova, G.Mladenov, “Characterization of Powerful Electron Beams”, Proceedings of DAE-BRNS Symposium on Electron Beam Technology and Applications, SEBTA 2005, Mumbai, India, ed. M.Mascarenhas, (2005), pp.307-322.

  41. V.Vassileva, G.Mladenov, K.Vutova, T.Nikolov, E.Georgieva, “Oxygen removal during electron beam drip melting and refining”, Vacuum, 77, (2005), 429-436.

  42. G.Mladenov, K.Vutova, I.Raptis, P.Argitis, Final Report on NATO Science for Peace Programme SfP Project No 973718 “Damage Free Submicron Structures of High Temperature Superconducting Thin Films” - “SubHTS”, (2005), pp.1-82.

  43. Г.Младенов, К.Вутова, “Положително оценени постижения на учени от БАН в Индия. Електроннолъчево заваряване във вакуум.”- трета част, Новости - информационен бюлетин за наука и технологии на БАН, бр.6 (22), (2005), стр.1-2.

  44. K.Vutova, G.Mladenov, T.Tanaka, T.Takagi, “Investigation of ion penetration in silicon during plasma-based ion implantation”, J. Electronics and Electrical Engineering, 5-6, (2006), 186-188.

  45. E.Koleva, V.Vassileva, K.Vutova, G.Mladenov, “Electron beam melting and refining of refractory and reactive metals”, J. Electronics and Electrical Engineering, 5-6, (2006), 136-140.

  46. G.Djanovski, M.Beshkova, S.Velinova, D.Mollov, P.Vlaev, D.Kovacheva, K.Vutova, G.Mladenov, “Deposition of CeO2 Films on Si(100) Substrate by Electron Beam Evaporation”, Plasma Processes and Polymers, 3 (2), (2006), 197-200.

  47. G.Mladenov, A.Yanev, K.Vutova, E.Koleva, G.Djanovsky, V.Videkov, M.Petkov, V.Ranev, “Microwave band-pass 5GHz filter utilizing high-temperature superconducting film”, Int. Journal IEEE – Annual School. Lectures., 25(2), (2005), 21-24.

  48. E. Koleva, V.Vassileva, K.Vutova, G.Mladenov, “Process Analysis and Quality Control at EBMR of Refractory and Reactive Metals”, Proc. of the Intern. Conf. on High-Power Electron Beam Technology, Harrah’s Reno, Nevada USA, (2006), pp.5/1-11.

  49. Г.Младенов, В.Василева, К.Вутова, Т.Николов, Е.Георгиева, “Електроннолъчево топене и рафиниране на реактивни и труднотопими метали”, Електротехника и електроника, бр.7-8, (2006), 13-21.

  50. K.Vutova, G.Mladenov, T.Tanaka, T.Takagi, “Investigation of ion penetration in silicon during plasma-based ion implantation”, J. Physics, 49 (8), (2006), 216-218.

  1. V.Vassileva, K.Vutova, G.Mladenov, “Analysis of the thermodynamic conditions of refining during electron beam melting of refractory metals”, Materials Science and Engineering Technology, 37 (7), (2006), 613-618.

  2. E.Koleva, K.Vutova, G.Mladenov, “Modeling of exposure and development of resist profiles”, J. Electronics and Electrical Engineering, 5-6, (2006), 194-198.

  3. G.Mladenov, K.Vutova, News, Physics and Astronomy, (2006), pp.9-19.

  4. K.Vutova, G.Mladenov, I.Raptis, A.Olziersky, “Process simulation at electron beam lithography on different substrates”, Journal of Materials Processing Technology, 184 (1-3), (2007), 305-311.

  5. К.Вутова, “Моделиране на физични процеси при обработка на материали с електронни и йонни снопове”, дисертация за присъждане на научната степен “доктор на физическите науки”, София, 2007.

  6. K.Vutova, G.Mladenov, T.Tanaka, K.Kawabata, I.Rangelow, “Electron and ion beam lithography simulation for sub-quarter-micron patterns”, Nano Trends: A Journal of Nanotechnology and its Applications, 2 (1), (2007), 32-47.

  7. K.Vutova, E.Koleva, G.Mladenov, I.Kostic, T.Tanaka, K.Kawabata, “Some peculiarities of resist profile simulation for positive tone chemically amplified resists in electron beam lithography”, Annual Report 2007, Institute of electronics, BAS, ed. N.Gerassimov, Ch.Gelev, (2008), 81-89.

  8. K.Vutova, G.Mladenov, “Computer simulation of micro- and nano- structures at electron and ion lithography”, Journal of Optoelectronics and Advanced Materials, 10 (1), (2008), 91-97.

  9. E.Koleva, V. Vassileva, K. Vutova, G. Mladenov, K. Velev, “Analysis of inclusions removal and behaviour for the quality control of EBMR of Ti and Cu”, Proceedings of the International Conference “ebeam 2008”, 26-28 Oct. 2008, Reno, Nevada, USA, pp.21-31.

  10. K.Vutova, V.Vassileva, E.Koleva, E.Georgieva, G.Mladenov, D.Mollov, M.Kardjiev, “Investigation of electron beam melting and refining of Ti and Ta scrap”, J. Electronics and Electrical Engineering, 5-6, (2009), 252-259.

  11. G.Mladenov, E.Koleva, K.Vutova, I.Kostic, V.Spivak, A.Bencurova, A.Ritomsky, “Resists for electron beam nanolithography”, J. Electronics and Electrical Engineering, 5-6, (2009), 13-20.

  12. E.Koleva, G.Mladenov, V.Vassileva, K.Vutova, “Development of an engineering support system for modeling and control of the processes of EBMR of metals”, Annual Report 2008, Institute of electronics, BAS, ed. N.Gerassimov, Ch.Gelev, (2009), 83-93.

  13. T.Tanaka, K.Vutova, E.Koleva, G.Mladenov, T.Takagi, “Surface modification of plastic films by charged particles”, Polymer Surface Modification: Relevance to Adhesion, K.L.Mittal (Ed.), VSP/Brill, Leiden, Vol. 5, (2009), 96-106.

  14. G.Mladenov, K.Vutova, E.Koleva, “Computer Simulation of electron and ion beam lithography of nanostructures”, Phys.Chem.Solid State, 10 (3), (2009), 707-714.

  15. K.Vutova, V.Vassileva, E.Koleva, G.Mladenov, E.Georgieva, “Titanium regeneration from waste product”, Proc. of the International Conference ”Ti-2009”, 17-20 May 2009, Odessa, Ukraine, (2009), 74-79.

  16. K.Vutova, E.Koleva, G.Mladenov, I.Kostic, “Some peculiarities of resist-profile simulation for positive-tone chemically amplified resists in electron-beam lithography”, Journal Vacuum Science and Technology B – Microelectronics and Nanometer Structures, 27 (1), (2009), 52-57.

  17. K.Vutova, E.Koleva, G.Mladenov, I.Kostic, T.Tanaka, K.Kawabata, “A simulation model for Chemically Amplified Resist CAMP6”, Microelectronic Engineering, 85, (2009), 714-717.

  18. K.Vutova, G.Mladenov, Chapter 17. Computer simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure modeling at electron and ion beam lithography, in: M. Wang, ed., Book Lithography, INTEH, (2010) 319-350.

  19. K.Vutova, E.Koleva, G.Mladenov, Chapter 18. Computer simulation of Processes at Electron and Ion Beam Lithography, Part 2: Simulation of resist developed images at electron and ion beam lithography, in: M. Wang, ed., Book Lithography, INTEH, (2010) 351-378.

  20. K.Vutova, V.Vassileva, E.Koleva, E. Georgieva, G.Mladenov, D.Mollov, M.Kardjiev, “Investigation of Electron Beam Melting and Refining of Titanium and Tantalum Scrap”, Journal of Materials Processing Technology, 210, (2010), pp.1089-1094.

  21. K.Vutova, E. Koleva, G.Mladenov, I.Kostic, T.Tanaka, “Computer simulation of resist profiles at electron beam nanolithography”, Microelectronics Engineering, 87, (2010), 1108-1111.

  22. E.Koleva, G.Mladenov, I.Batchkova, K.Velev, V.Vassileva, K.Vutova, “Quality control of refining process at electron beam melting and development and implementation of engineering support system for process modeling and control”, Supplemental Proceedings: v.3: General Paper Selections TMS (The Minerals, Metals&Materials Society), 14-18 Febr. 2010, Seattle, USA, pp.777-784 (2010).

  23. K.Vutova, G.Mladenov, “Photoelectron signal simulation at surface analysis”, Chapter in a special review book “Practical Aspects and Applications of Electron Beam Irradiation”, Editors Team: M.Nemtanu, M.Brasoveanu, acc. for publ. (2010).

  24. V.Vassileva, K.Vutova, E.Koleva, G.Mladenov, “Recycling of Hf and Ta wastes utilizing electron beam melting in vacuum“, J. Electronics and Electrical Engineering, acc. for publ. (2010).

  25. G.Mladenov, E.Koleva, K.Vutova, “Electron lithography of submicron and nano structures”, Chapter in a special review book “Practical Aspects and Applications of Electron Beam Irradiation”, Editors Team: M.Nemtanu, M.Brasoveanu, acc. for publ. (2010)

  26. E.Koleva, K.Vutova, G.Mladenov, D.Todorov, “Method of emittance evaluation”, Proc. of 16th International SHCE and 10th International CMM, 19-24 September 2010, Tomsk, Russia, accepted for publ. (2010).

  27. G.Mladenov, E.Koleva, K.Vutova, V.Vasileva, “Experimental and theoretical studies of electron beam melting and refining”, Chapter in a special review book “Practical Aspects and Applications of Electron Beam Irradiation”, Editors Team: M.Nemtanu, M.Brasoveanu, acc. for publ. (2010)

  28. K.Vutova, E.Koleva, V.Vassileva, G.Mladenov, “Surface modification of reactive metals by electron beam surface melting”, Proc. of 16th International SHCE and 10th International CMM, 19-24 September 2010, Tomsk, Russia, accepted for publ. (2010).



Общ брой – 112, от които:
1. Публикации в пълен текст в специализирани научни издания (глави от книги, списания, Proc. на конференции и др.) – 110 бр.

От тях: глави от книги – 5 бр.; в списания – 64 (над 40 в списания с импакт фактор); в пълен текст в материали на конференции – 39 публикации (от които 28 в межд.конф., 8 в нац.конф. с межд.участие); отчети на международни договори, финансирани от чуждестранни източници- 2 бр.

2. Дисертации - 2 бр.
Каталог: users -> files
files -> Списък на публикациите на ст н. с. І ст дтн инж. Оханес Сантурджян до края на 2010
files -> Автобиография професор Атанас Дерменджиев
files -> С п и с ъ к №1 на научните доклади и публикации на
files -> Иформация за публикациите (2000–2010 г.) На доц. Д-р алберт бенбасат монографии, учебници, студии и др
files -> Конкурс за редовен асистент по "Персийска литература и култура" в су "Св. Климент Охридски", където постъпва на работа в Центъра за източни езици и култури към Факултета по класически и нови филологии
files -> Богомил николов
files -> Биография На член кореспондент проф д-р Владимир Атанасов Овчаров Адрес: Катедра по анатомия и хистология, Медицински факултет, Медицински
files -> Сп и с ъ к на публикациите на проф дин Казимир Попконстантинов награди
files -> Книга за учителя на първа група в детската градина : Ч. 1 / Под ред на Елка Петрова. София : Нар просв., 1984 Ч. Надежда Витанова и др.; Под ред на Елка Петрова
files -> Д ф н донка петканова I. Книги Дамаскините в българската литература


Сподели с приятели:




©obuch.info 2024
отнасят до администрацията

    Начална страница