Централна лаборатория по слънчева енергия и нови енергийни източници Българска академия на науките
Gesheva K. A., Krisov T. A., Simkov U. I., Beshkov G. D
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280. Sun, R., Xu, T., Zhang, J.-w., Xue, Q.-j.,“The study of ion mixed amorphous carbon films on single crystal silicon by C ion implantation”, Applied Surface Science 252 (12), pp. 4236-4243(2006). 50. F. Hamelmann, K. Gesheva, T. Ivanova, A. Szekeres, M. Abrashev, U. Heinzmann, “Optical and Electrochromic Characterization of Multilayered Mixed Metal Oxide Thin Films”, J. Optoelectronics and Advanced Materials 7(1) (2005) 393-396. 281. E. A. F.I. Saad, “Dielectric properties of molybdenum oxide thin films”, J. Optoelectronics and Advanced Materials 7(5 (2005) 2743-2752. 282. Niklasson, G.A., Granqvist, C.G. , “Electrochromics for smart windows: Thin films of tungsten oxide and nickel oxide, and devices based on these”, Journal of Materials Chemistry 17 (2), (2007) pp. 127-156 283. Granqvist, C.G., “Transparent conductors as solar energy materials: A panoramic review”, Solar Energy Materials and Solar Cells 91 (2007), pp. 1529-1598 284. Chu, W.G., Zhang, L.N., Wang, H.F., Han, Z.H., Han, D., Li, Q.Q., Fan, S.S. “Direct thermal oxidization evaporation growth, structure, and optical properties of single-crystalline nanobelts of molybdenum trioxide”,Journal of Materials Research 22 (2007) 1609-1617. 51. K. Gesheva, T. Ivanova, “A Low Temperature Atmospheric Pressure CVD Process for Growing Thin Films of MoO3 and MoO3 – WO3 for Electrochromic Device Applications”, Chemical Vapor Deposition 12 (2006) 231-239 285. Rahmani, M.B., Keshmiri, S.H., Yu, J., Sadek, A.Z., Al-Mashat, L., Moafi, A., Latham, K., (...), Kalantar-zadeh, K., Gas sensing properties of thermally evaporated lamellar MoO3 ,
286. Optical properties of molybdenum oxide thin films deposited by chemical vapor transport of MoO3(OH)2, Lee, Y.J., Jeon, H.Y., Park, C.W., Kim, D.-G., Kim, Y.D. TMS Annual Meeting 3, pp. 27-32, 2009. 287. Optical properties of molybdenum oxide thin films deposited by chemical vapor transport of MoO3(OH)2, Lee, Y.J., Seo, Y.I., Kim, S.-H., Kim, D.-G., Kim, Y.D. 2009 Applied Physics A: Materials Science and Processing 97 (1), pp. 237-241. 288. Lee, Y.J., Nichols, W.T., Kim, D.-G., Kim, Y.D., “Chemical vapour transport synthesis and optical characterization of MoO3 thin films “, 2009 Journal of Physics D: Applied Physics 42 (11), art. no. 115419. 289. Deposition of Mo oxide and metallic Mo films by chemical vapor transport of MoO3(OH)2 Lee, Y.J., Seo, Y.I., Kim, S.H., Kim, D.-G., Kim, Y.D., 2009 Chemical Vapor Deposition 15 (7-9), pp. 199-203. 290. Granqvist, C.G.,“Transparent conductors as solar energy materials: A panoramic review” Solar Energy Materials and Solar Cells 91 (2007), pp. 1529-1598 52. K. Gesheva, T. Ivanova, F. Hamelmann, “Electrically Activated Thin Film Optical Coatings as Functional Layers in Electrochromic Devices”, Solar Energy Materials and Solar Cells 90 (2006) 2532-2541. 291. Takeyasu, T., Takase, S., Shimizu, Y., “Electrochromic properties of mixed metal oxide thin-film and its application to nitrate-ion sensor”, 2007 ECS Transactions 3 (38), pp. 1-6. 292. Wang, W., Pang, Y., Hodgson, S.N.B. , “XRD studies of thermally stable mesoporous tungsten oxide synthesised by a templated sol-gel process from tungstic acid precursor”, 2009 Microporous and Mesoporous Materials 121 (1-3), pp. 121-128. 293. Sivakumar, R., Sanjeeviraja, C., Jayachandran, M., Gopalakrishnan, R., Sarangi, S.N., Paramanik, D., Som, T. High temperature grown transition metal oxide thin films: Tuning physical properties by MeV N+-ion bombardment”, 2008 Journal of Physics D: Applied Physics 41 (12), art. no. 125304 0 294. Sivakumar, R., Sanjeeviraja, C., Jayachandran, M., Gopalakrishnan, R., Sarangi, S.N., Paramanik, D., Som, T, “MeV N+-ion irradiation effects on α-MoO3 thin films”, Journal of Applied Physics 101 (3), (2007), art. no. 034913. 295 Granqvist, C.G., “Transparent conductors as solar energy materials: A panoramic review”, Solar Energy Materials and Solar Cells 91 (2007), pp. 1529-1598 53. T. Ivanova, K. Gesheva, F. Hamelmann, G. Popkirov, M. Abrashev, M.Ganchev, E. Tzevtkova, “Optical and Electrochromic Properties of CVD Mixed MoO3-WO3 Thin Films”, (2004), Vacuum 76 (2, 3) 195 – 198. 296. Mayhall, N.J., Rothgeb, D.W., Hossain, E., Raghavachari, K., Jarrold, C.C., “Electronic structures of MoWOy - and MoWOy determined by anion photoelectron spectroscopy and DFT calculations, , 2009 Journal of Chemical Physics 130 (12), art. no. 124313. 297. Rothgeb, D.W., Hossain, E., Kuo, A.T., Troyer, J.L., Jarrold, C.C., “Structures of Mox W (3-x) O6 (x=0-3) anion and neutral clusters determined by anion photoelectron spectroscopy and density functional theory calculations”, Journal of Chemical Physics 131 (4), art. no. 044310, 2009. 298. Deki, S., Béléké, A.B., Kotani, Y., Mizuhata, M., “Liquid phase deposition synthesis of hexagonal molybdenum trioxide thin films”, Journal of Solid State Chemistry 182 (9), pp. 2362-2367, 2009. 299. Lee, Y.J., Seo, Y.I., Kim, S.-H., Kim, D.-G., Kim, Y.D., „Optical properties of molybdenum oxide thin films deposited by chemical vapor transport of MoO3(OH)2”, Applied Physics A: Materials Science and Processing 97 (1), pp. 237-241, 2009. 300. E. Avendano, L. Berggren, G.A. Niklasson, C.G. Granqvist, A. Azens, “Electrochromic materials and devices: Brief survey and new data on optical absorption in tungsten oxide and nickel oxide films”, Thin Solid Films 496(1) (2006) 30-36. 301. Niklasson, G.A., Granqvist, C.G. , “Electrochromics for smart windows: Thin films of tungsten oxide and nickel oxide, and devices based on these”, Journal of Materials Chemistry 17 (2), (2007) pp. 127-156 54. T. Ivanova, K. A. Gesheva, M. Ganchev, E. Tzvetkova, "Electrochromic Behaviour of CVD Molybdenum Oxide and Mo - W Mixed Oxide Thin Films", J. Materials Science: Materials in Electronics, 14 (2003) 755-756. 302. Liu, D., Lei, W., Chen, X., Hao, J., Jin, Y., Cui, Q., Zou, G, “Pressure-induced structural transitions in MoO 3·xH2O (x = 1/2, 2) molybdenum trioxide hydrates: A Raman study: 2009, Journal of Physical Chemistry B 113 (52), pp. 16479-16482 0 303. Liu, D., Lei, W.W., Hao, J., Liu, D.D., Liu, B.B., Wang, X., Chen, X.H., (...), Jiang, S., “High-pressure Raman scattering and x-ray diffraction of phase transitions in MoO3”, 2009, Journal of Applied Physics, 105 (2), art. no. 023513.
306. Epifani, M., Imperatori, P., Mirenghi, L., Schioppa, M., Siciliano, P., Synthesis and characterization of MoO3 thin films and powders from a molybdenum chloromethoxide , Chemistry of Materials 16 (25) (2004) 5495-5501; 307. Niklasson, G.A., Granqvist, C.G. “Electrochromics for smart windows: Thin films of tungsten oxide and nickel oxide, and devices based on these”, Journal of Materials Chemistry 17 (2), (2007) pp. 127-156 55. K. A. Gesheva, T. Ivanova, F.Hamelmann, “Optical properties of CVD transition metal oxides as functional layers in “smart windows” and X-Ray mirrors”, J. Optoelectronics and Advanced Materials 7(3) (2005) 1243-1252. 308. Laurinavichute, V.K., Vassiliev, S.Yu., Plyasova, L.M., Molina, I.Yu., Khokhlov, A.A., Pugolovkin, L.V., Borzenko, M.I., Tsirlina, G.A., “Cathodic electrocrystallization and electrochromic properties of doped rechargeable oxotungstates”, 2009 Electrochimica Acta 54 (23), pp. 5439-5448. 309. Z.H.Barber, “The control of thin films deposition and recent developments in oxide growth”, Journal of Materials Chemistry 16(4) (2006) 334-344. 310. Granqvist, C.G., “Transparent conductors as solar energy materials: A panoramic review” Solar Energy Materials and Solar Cells 91 (2007), pp. 1529-1598. 311. E. A. F.I. Saad, “Dielectric properties of molybdenum oxide thin films”. Optoelectronics and Advanced Materials 7(5 (2005) 2743-2752. 312. Niklasson, G.A., Granqvist, C.G. “Electrochromics for smart windows: Thin films of tungsten oxide and nickel oxide, and devices based on these”, Journal of Materials Chemistry 17 (2), (2007) pp. 127-156. 313. Ghule, A.V., Ghule, K., Tzing, S.-H., Ling, Y.-C.Synthesis and characterization of silver-nanoparticle-deposited α-Bi2Mo3O12 nanorods”, European Journal of Inorganic Chemistry (21), pp. 3342-3349, 2007. 56. F. Hamelmann, K. Gesheva, T. Ivanova, A. Szekeres, M. Abrashev, U. Heinzmann, “Optical and Electrochromic Characterization of Multilayered Mixed Metal Oxide Thin Films”, J. Optoelectronics and Advanced Materials 7(1) (2005) 393-396 314. Chu, W.G., Wang, H.F., Guo, Y.J., Zhang, L.N., Han, Z.H., Li, Q.Q., Fan, S.S., Catalyst-free growth of quasi-aligned nanorods of single crystal Cu 3Mo2O9 and their catalytic properties, Inorganic Chemistry 48 (3), pp. 1243-1249, 2009. 315. A. F. I. Saad, “Dielectric properties of molybdenum oxide thin films”, J. Optoelectronics and Advanced Materials, 7(5 (2005), 2743-2752. 316. Niklasson, G.A., Granqvist, C.G. , “Electrochromics for smart windows: Thin films of tungsten oxide and nickel oxide, and devices based on these”, Journal of Materials Chemistry 17 (2), (2007) pp. 127-156 57. F. Hamelmann, A. Brechling, A. Aschentrup, U. Heinzmann, P. Jutzi, J. Sandrock, U. Siemeling, T. Ivanova, A. Szekeres, K. Gesheva, “Thin Molybdenum Oxide Films Produced by Molybdenum Pentacarbonyl 1-Methylisonitrile with Plasma – assisted Chemical Vapor Deposition” Thin Solid Films 446 (2), 2004, 167 – 171. 317. Guizard, C., Princivalle, A., “Preparation and characterization of catalyst thin films”, Catalysis Today 146 (3-4), pp. 367-377, 2009. 318. Tyczkowski, J., Kapica, R., Łojewska, J., “Thin cobalt oxide films for catalysis deposited by plasma-enhanced metal-organic chemical vapor deposition”Thin Solid Films 515 (16 SPEC. ISS.) (2007) 6590-6595. 319. Huang, Q., Wang, Y., Han, L., „Preparation of molybdenum black solar selective absorbing coating“ Taiyangneng Xuebao/Acta Energiae Solaris Sinica 28 (11), pp. 1217-1220, 2007. 58. M. Kalitzova, K. Gesheva, E. Vlakhov, Y. Marinov, D. Gogova, T. Ivanova, C. Angelov, N. Pashov, G. Zollo, and G. Vitalli, “High Frequency Electromagnetic Field Processing of Amorpouse Silicon Layers Containing Nanoclusters Produced by implantation of metal ions in Si (1000) matrix”, Nuclear Instruments and Methods in Physics Research B 229 (2005) 65-72. 320. Sun, R., Xu, T., Xue, Q.-j., “Surface modification of single crystal silicon by Ar+ ion implantation and vacuum deposition of amorphous carbon coating”, Surface and Coatings Technology 200 (20-21), (2006) pp. 5794-5799, 2006. 321. Sun, R., Xu, T., Zhang, J.-w., Xue, Q.-j.,“The study of ion mixed amorphous carbon films on single crystal silicon by C ion implantation”, Applied Surface Science 252 (12), pp. 4236-4243(2006) 59. Hamelmann F., Aschentrup A., Brechling A., Heinzmann U., Abrashev M., Szekeres A., Gesheva K., Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases”,(2004) Vacuum, 76 (2-3), pp. 139-142. 322. Pereira, J., Massereau-Guilbaud, V., Géraud-Grenier, I., Plain, A., “CH and CN radical contribution in the particle formation generated in a radio-frequency CH4/N2 plasma”, Plasma Processes and Polymers 2 (8) (2005) pp. 633-640.
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